微纳光子学技术
研究微米级或纳米级特征尺寸的光学元件设计、制造及应用
液晶微纳光子学
采用无掩膜激光直写技术在基底表面上通过光控取向方式制备出微米、纳米级尺度二维结构的几何相位光学元件。自研核心材料，核心设备以及完整的工艺流程，构建国内首条基于液晶微纳光子学技术的量产线。
刻蚀工艺
计算机辅助设计相位结构，进行刻蚀公差仿真分析。采用半导体工艺在基底表面进行减材刻蚀，提升元件抗损伤阈值。结合应用光路设计及应用，对刻蚀DOE进行表征。
超快激光加工工艺
超快激光在石英内部改性实现双折射特性。在二维平面内实现改性区域方位角变化，从而实现几何相位调制。
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